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Submicron-level positioning accuracy parallel regulating platform and regulating method thereof

A technology with positioning accuracy and sub-micron level, which can be used in machine/support, supporting machine, mechanical equipment, etc., and can solve the problem that the four-degree-of-freedom parallel mechanism cannot be used with precision measuring instruments.

Inactive Publication Date: 2011-10-19
SHAANXI HAOMAN ELECTROMECHANICAL TECH ENG
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  • Abstract
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  • Application Information

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Problems solved by technology

[0004] As mentioned above, in recent years, the four-degree-of-freedom parallel mechanism has been developed, but the above-mentioned four-degree-of-freedom parallel mechanism cannot be applied to precision measuring instruments such as roundness meters to realize the adjustment of the position and attitude of the workpiece to be measured

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  • Submicron-level positioning accuracy parallel regulating platform and regulating method thereof
  • Submicron-level positioning accuracy parallel regulating platform and regulating method thereof
  • Submicron-level positioning accuracy parallel regulating platform and regulating method thereof

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Embodiment Construction

[0051] Such as figure 1 , figure 2 , image 3 , Figure 4 , Figure 5 , Image 6 , Figure 7 and Figure 8 As shown, the parallel adjustment platform with submicron level positioning accuracy described in the present invention includes a fixed platform 1 that is fixed and arranged horizontally, six telescopic poles installed on the fixed platform 1, and is horizontal in the initial state. The moving platform 3 that is arranged and driven by the six telescopic poles can move in a straight line in the left and right and front and rear directions and can rotate around the left and right and front and rear directions. The current state of the counter moving platform 3 is A measuring system 4 for measuring the position and its rotation angle around the left and right and front and rear directions on the horizontal plane, a controller 5 electrically connected to the measuring system 4, and a parameter input unit 11 connected to the controller 5, the six can The upper ends of...

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Abstract

The invention discloses a submicron-level positioning accuracy parallel regulating platform and a regulating method thereof. The parallel regulating platform comprises a fixed platform, six stretchable struts, a moving platform, a measuring system, a controller and a parameter input unit, wherein the moving platform can move straightly at the left, right, front and rear direction and can rotate surrounding the left, right, front and rear direction; the controller is electrically connected with the measuring system; the parameter input unit is connected with the controller; and the upper end part of each stretchable strut is installed on the moving platform through a spherical hinge, and the lower end part of each stretchable strut is installed on the fixed platform through a hook hinge. The regulating method comprises the following steps: firstly, measuring the current position and posture information of the moving platform; secondly, inputting the ideal position and the ideal posture information of the moving platform; thirdly, converting and processing the stretch of each stretchable strut; and fourthly, regulating the driving. The platform provided by the invention is designed reasonably, is convenient to install, is simple and convenient to operate and is convenient to realize, has high regulation accuracy and wide application range, can be effectively suitable for accurate measuring instruments, such as a roundness measuring instrument, and satisfies the requirements of regulating the position and posture of workpieces to be tested on the accurate measuring instruments.

Description

technical field [0001] The invention belongs to the technical field of platform position and attitude adjustment, and in particular relates to a parallel adjustment platform with submicron level positioning accuracy and an adjustment method thereof. Background technique [0002] In recent years, parallel structures with fewer degrees of freedom (specifically, parallel structures with less than six degrees of freedom) have attracted attention. Parallel mechanisms with less than six degrees of freedom have the advantages of simple structure, low manufacturing cost, and relatively easy control. For some systems that require less than 6 degrees of freedom mechanical structure, the parallel structure with less degrees of freedom is very practical. Among them, the four-degree-of-freedom parallel mechanism is a kind of parallel structure with few degrees of freedom, and its number is relatively small compared with the three-degree-of-freedom parallel mechanism. Therefore, the curr...

Claims

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Application Information

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IPC IPC(8): F16M11/12F16M11/20
Inventor 王建仓何松薛群利
Owner SHAANXI HAOMAN ELECTROMECHANICAL TECH ENG
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