Cleaning device and coating device for slit nozzle

A slit nozzle and cleaning device technology, which is applied to spray devices, spray devices, and devices for coating liquid on surfaces, etc., can solve the problems of low cleaning operation efficiency, time-consuming, troublesome and troublesome, etc., and achieve particle suppression. produced effect

Active Publication Date: 2015-04-08
TOKYO ELECTRON LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the slit gap of this type of slit nozzle is generally an extremely fine gap of 100 μm or less as described above, and it is very troublesome and laborious to insert a thin plate into the gap and clean it. The main reasons for the maintainability of cladding equipment or the decrease in operating rate
In addition, due to the inefficient and time-consuming cleaning operation, it also results in more particles scattered around during the operation

Method used

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  • Cleaning device and coating device for slit nozzle
  • Cleaning device and coating device for slit nozzle
  • Cleaning device and coating device for slit nozzle

Examples

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Embodiment Construction

[0041] Next, preferred embodiments of the present invention will be described with reference to the drawings.

[0042] figure 1 A structural example of a resist coating device to which the slit nozzle cleaning device of the present invention can be applied is shown.

[0043] This non-spin coating coating device has: utilize the pressure of gas to make the substrate to be processed, such as the glass substrate G for FPD floating in the air, the floating workbench 10, for floating on the workbench 10 along the length direction of the floating workbench ( X direction) the substrate conveying mechanism 20 for conveying the substrate G floating in the air, the slit nozzle 32 for supplying the resist liquid to the upper surface of the substrate G conveyed on the floating table 10, and the slit nozzle 32 for supplying the substrate G in the coating process. The nozzle regeneration part 42 regenerates the slit nozzle 32 between intervals.

[0044] The upper surface of the floating tab...

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Abstract

The invention provides a cleaning device and a coating device for a slit nozzle, the cleaning device and the coating device are capable of automatically and efficiently cleaning slit inner of a slit nozzle when inhibiting generation of particles. The cleaning device for a slit nozzle (70) comprises: a nozzle cleaning unit (56), an X-direction moving part (54) used for making a whole startup filling processing part move on a substrate conveying direction (X direction), and a Y-direction part (60) used for making the nozzle cleaning unit move in a nozzle length direction (Y direction) in a housing (44). The nozzle cleaning unit (56) comprises: a thin-plate scraper blade (74) capable of being inserted from the outside to a slit (32a) of a slit nozzle (32) or being pulled from the inner of the slit (32a), a lifting mechanism (78) used for making the scraper blade and a maintenance part (76) integratedly move in a spray-out direction of the slit nozzle, and a rotating mechanism (82) used for making the scraper blade rotate.

Description

technical field [0001] The present invention relates to a coating device of a non-spin coating method, and more particularly to a slit nozzle cleaning device for cleaning the inside of a slit of a slit nozzle, which is used in a coating process of a non-spin coating method. Background technique [0002] In the photolithography process in the manufacturing process of flat panel displays (FPDs) such as LCDs, the following non-spin coating method is widely used: a long slit nozzle with a slit-shaped discharge port is placed opposite to the The substrate to be processed, such as a glass substrate, is relatively moved, and a coating liquid such as a processing liquid or a chemical liquid, such as a resist liquid, is applied to the substrate. [0003] In a typical non-spin coating method, the resist liquid is sprayed from the slit nozzle in a strip shape relative to the substrate fixed and placed on the table, while the slit nozzle is arranged in a direction perpendicular to the n...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B05B15/02B05C5/02
CPCB05B1/044B05B15/52B05C11/10B05C21/00
Inventor 元田公男宫崎文宏太田义治川内拓男
Owner TOKYO ELECTRON LTD
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