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Device of chemical vapor deposition diamond or other substances

A chemical vapor deposition and diamond technology, applied in gaseous chemical plating, metal material coating process, coating, etc., can solve the problems of large gas consumption and high cost, and achieve environmental protection, consumption saving, and good economic benefits and the effect of social benefits

Active Publication Date: 2013-08-28
河北平钻人造金刚石有限公司
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Problems solved by technology

[0003] The purpose of the present invention is to provide a device for chemical vapor deposition of diamond, the main purpose is to solve the problem of excessive gas consumption and high cost in the chemical vapor deposition process using DC arc spraying method, its structure is simple, not only can ensure the quality of the product , and the gas consumption is low, the cost is low, the emission is reduced, it is beneficial to environmental protection, and the economic benefit is good

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  • Device of chemical vapor deposition diamond or other substances

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Embodiment Construction

[0012] see figure 1 , the device for chemical vapor deposition of diamond includes a DC arc jet plasma torch 1, a vacuum chamber 2, and a substrate 3, and a gas recycling mechanism is arranged between the vacuum chamber 2 and the DC arc jet plasma torch 1; the vacuum chamber 2 is a closed type structure, and is provided with an outlet connected to the gas recycling mechanism, the gas recycling mechanism is provided with a booster pump 6, and the outlet pipe of the booster pump 6 is connected with the exhaust pipe and the inlet pipe of the DC arc jet plasma torch 1; the gas return The mechanism is provided with a vacuum chamber pressure regulating valve 5, and the exhaust pipe of the booster pump 6 is provided with a booster pump outlet pressure regulating valve 8 and an exhaust pump 9; the vacuum chamber 2 is provided with a vacuum chamber pressure measuring vacuum gauge 4, increasing The outlet pipe of the pressure pump 6 is provided with a vacuum gauge 7 at the outlet of the...

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Abstract

The invention provides a device of chemical vapor deposition diamond, relating to the technical field of functional material preparation. The device comprises a direct current arc jet plasma torch, a vacuum chamber and a substrate, wherein a gas recycling mechanism is arranged between the vacuum chamber and the plasma torch. Compared with the prior art, the invention better solves the problem of long-standing large gas consumption in the chemical vapor deposition diamond with the direct current arc jet method in the prior art, has simple structure and reasonable technology, can ensure product quality, greatly saves working medium gas usage amount, greatly lowers cost, reduces emission, is favourable for environment protection and has favourable economic benefit and social benefit.

Description

technical field [0001] The invention belongs to the technical field of functional material preparation. Background technique [0002] The method of chemical vapor deposition of diamond is generally as follows: hydrogen, carbon-containing gas (such as methane), etc. are dissociated into hydrogen atoms, carbon atoms and various hydrocarbon groups after passing through a high-temperature activation source. When the gas flow encounters a cooler substrate, under the action of hydrogen atoms, carbon atoms are deposited into diamonds. At present, according to the different activation sources, there are three main methods for preparing diamond by chemical vapor deposition: microwave method, hot wire method and DC arc spray method. The DC arc jet method is known for its fast growth rate and good product quality, but has also been criticized for its very high gas consumption. Contents of the invention [0003] The purpose of the present invention is to provide a device for chemica...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C16/27
Inventor 郭辉姜龙张永贵何奇宇王志娜
Owner 河北平钻人造金刚石有限公司
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