Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

High-precision quick level adjusting device

A leveling device and high-precision technology, which is applied in the direction of instruments, electrical components, and instrument parts, etc., can solve the problems of insufficient stability of the leveling mechanism and low leveling accuracy, and achieve the effect of eliminating gaps and improving accuracy

Active Publication Date: 2008-03-26
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
View PDF2 Cites 11 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The purpose of the present invention is to provide a high-precision fast leveling device, which can effectively solve the shortcomings of low overall leveling accuracy and insufficient stability of the leveling mechanism in the prior art

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • High-precision quick level adjusting device
  • High-precision quick level adjusting device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0020] The high-precision fast leveling device of the present invention will be described in further detail below in conjunction with a preferred embodiment.

[0021] Please refer to Figure 1 to Figure 3, the high-precision fast leveling device of the present invention includes an adjustment platform 1, an installation base 6, and multiple sets of parallel reeds 2 installed between the adjustment platform 1 and the installation base 6, and online position measurement Sensor assembly 3 , eccentric wheel / cam assembly 4 , pretension tension spring 5 , executive wheel assembly 7 and drive motor 8 .

[0022] In this embodiment, both the adjustment platform 1 and the installation base 6 are circular, and three sets of parallel reeds 2 are used for connection. between 6. Correspondingly, the leveling device also includes three sets of on-line position measurement sensor assemblies 3, eccentric wheel / cam assembly 4 and executive wheel assembly 7, the on-line position measurement sens...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

This invention provides an accurate quick leveling device including a leveling platform, an installing base, multiple sets of parallel reeds between the leveling platform and the base, on-line position measurement sensor components, eccentric / cam components, pre-strain springs and an executing wheel component, all of which are set on the base corresponding to each other in a same included angle.

Description

technical field [0001] The invention relates to a fast leveling mechanism, in particular to a high-precision fast leveling device used in precision instruments and equipment in the field of semiconductor manufacturing. Background technique [0002] In the field of semiconductor manufacturing, the leveling of workpieces by precision instruments and equipment usually requires high precision, high efficiency and no damage to the surface of the workpiece. Some automatic leveling mechanisms in the prior art use motors plus screw nuts or piezoelectric ceramics to level the workpiece at three or four points under the bearing platform. This leveling mechanism does not damage the surface of the workpiece, but due to the wire There is a gap in the lever nut, and the piezoelectric ceramic has a gap, so it is difficult to achieve high precision. At the same time, because it needs to be adjusted point by point repeatedly, and because it is adjusted on the back of the workpiece, it needs ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): H01L21/00G12B5/00
Inventor 朱岳彬
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com