X-ray fluorescence spectrometer

Abstract

A X-ray fluorescence spectrometer of the present invention simultaneously generates an analytical pulse-height width profile and a narrow pulse-height width profile that are distributions of intensities of secondary X-rays (7) against scan angles (2θ) set by an interlocking unit (10) on the basis of a differential curve which is output by a multichannel pulse-height analyzer (13), as well as a predetermined analytical pulse-height width for an analytical line that is a primary reflection line and a predetermined narrow pulse-height width that is narrower than the analytical pulse-height width. Identification of the analytical lines is performed for the analytical pulse-height width profile and the narrow pulse-height width profile, and any analytical line identified only in the narrow pulse-height width profile is added to the analytical lines identified in the analytical pulse-height width profile to obtain an identification result of the analytical lines.

Description

CROSS REFERENCE TO THE RELATED APPLICATION[0001]This application is based on and claims Convention priority to Japanese patent application No. 2018-149950, filed Aug. 9, 2018, the entire disclosure of which is herein incorporated by reference as a part of this application.BACKGROUND OF THE INVENTIONField of the Invention[0002]The present invention relates to a sequential X-ray fluorescence spectrometer.Description of Related Art[0003]Sequential X-ray fluorescence spectrometers interlock a spectroscopic device and a detector to generate a 2θ profile that is a distribution of intensities of secondary X-rays against scan angles of 2θ, and perform peak search and identification of analytical lines in order to perform qualitative analysis. Many of such spectroscopic devices may simultaneously produce a primary reflection line obtained by primary diffraction of X-rays having a certain wavelength as well as a higher order reflection line (n-th order reflection line) obtained by higher-orde...

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Benefits of technology

[0008]In view of such conventional problems, an object of the present invention is to provide a sequential X-ray fluorescence spectrometer capable of quickly and accurately identifying analytical lines.

[0012]According to the X-ray fluorescence spectrometer of the present invention, a single scan using the multichannel pulse height analyzer generates, as 2θ profiles, an analytical pulse height width profile with a predetermined analytical pulse height width appropriate for cases where there is no higher order reflection line appearing at a close scan angle to that of an analytical line, as well as a narrow pulse height width profile with a predetermined narrow pulse height width appropriate for cases where there is a higher order reflection line appearing at a close scan angle to that of an analytical line. Also, since the analytical line(s) identified only in the narrow pulse height width profile is(are) automatically added to the analytical lines identified in the analytical pulse height width profile, it is possible to quickly and accurately identify the analytical lines.

[0016]In the case of this preferred configuration, the analytical pulse height width profile includes the analytical lines monochromated by the spectroscopic devices for removing the higher order reflection lines, and for each analytical element, an analytical line not or least overlapping with a higher order reflection line is automatically selected from the analytical lines processed by different spectroscopic devices or the analytical lines of mutually different kinds appearing in the analytical pulse height width profile and the narrow pulse height width profile. Therefore, it is possible to perform sufficiently accurate semi-quantitative analysis without requiring correction of overlaps of the higher order reflection lines based on the intensities of the selected analytical lines.

Problems solved by technology

In addition, even if such analytical processing based on measurement of standard samples is applied to individual analytical samples, it is not always possible to accurately estimate overlap of a higher order reflection line with a primary reflection line.

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