Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Attendance checking method and device based on face recognition, electronic equipment and storage medium

A face recognition and attendance technology, applied in character and pattern recognition, recording/indicating the time of events, registration/instruction, etc. The effect of the queuing problem

Pending Publication Date: 2022-07-29
SHENZHEN INTELLIFUSION TECHNOLOGIES CO LTD
View PDF0 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] At present, face recognition has been widely used in the clock-in and attendance of enterprises and institutions. However, the existing attendance equipment and systems based on face recognition require the active cooperation of users, and the efficiency of attendance is low. cause serious queuing problems

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Attendance checking method and device based on face recognition, electronic equipment and storage medium
  • Attendance checking method and device based on face recognition, electronic equipment and storage medium
  • Attendance checking method and device based on face recognition, electronic equipment and storage medium

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0032] The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present application. Obviously, the described embodiments are part of the embodiments of the present application, but not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those of ordinary skill in the art without creative work fall within the protection scope of the present application.

[0033] The terms "first", "second", "third" and "fourth" in the description and claims of the present application and the drawings are used to distinguish different objects, rather than to describe a specific order . Furthermore, the terms "comprising" and "having", and any variations thereof, are intended to cover non-exclusive inclusion. For example, a process, method, system, product or device comprising a series of steps or units is no...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses an attendance checking method and device based on face recognition, electronic equipment and a storage medium, and the attendance checking method comprises the following steps: carrying out video frame extraction on a real-time video to obtain a first frame image; performing face detection on the first frame image to obtain a first face image of the target attendance personnel, and adding the first face image into a face image set; performing first attendance checking on the target attendance checking personnel according to the first face image; if the first attendance is not passed, video frame extraction is carried out on the real-time video again to obtain a second frame image, and the second frame image is located behind the first frame image; determining whether the second frame image contains the target attendance personnel or not; if the second frame image contains the target attendance personnel, taking the second frame image as a new first frame image, and performing face detection on the new first frame image to obtain a second face image of the target attendance personnel; and according to the second face image or the face image set, carrying out first attendance checking on the target attendance checking person again.

Description

technical field [0001] The invention relates to the technical field of artificial intelligence, in particular to a face recognition-based attendance method, device, electronic device and storage medium. Background technique [0002] With the increasing advancement of technology, science and technology have now penetrated into every corner of our lives, such as artificial intelligence and face recognition technology. [0003] At present, face recognition has been widely used in commuting and attendance in enterprises and institutions. However, the existing attendance equipment and systems based on face recognition all require the active cooperation of users, resulting in low attendance efficiency and large crowd flow. cause serious queuing problems. SUMMARY OF THE INVENTION [0004] In order to solve the above problems in the prior art, the embodiments of the present application provide an attendance method, device, electronic device and storage medium based on face recogn...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G07C1/10G06V40/16G06V10/74G06K9/62
CPCG07C1/10G06F18/22
Inventor 徐国畅
Owner SHENZHEN INTELLIFUSION TECHNOLOGIES CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com