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Preparation method and application of visible light response hydrogen generation photocatalyst GO/SiC/WO3

A photocatalyst and visible light technology, applied in chemical instruments and methods, physical/chemical process catalysts, chemical/physical processes, etc., can solve the problems of easy recombination of electron holes, secondary pollution, and difficult contact of water molecules.

Active Publication Date: 2019-06-25
SHANDONG UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, there are some defects in itself that make it difficult to photolyze water, mainly in the following aspects: first, SiC has certain hydrophobicity, which makes it difficult to contact with water molecules; second, electron holes are easy to At present, Yuan Wenxia's research group uses CdS and Pt to dope and modify SiC, and the hydrogen production rate is 259μmol·h -1 g -1
However, Cd is a heavy metal, and there is a certain risk of secondary pollution, and Pt is a precious metal, and its large-scale industrial application is subject to certain restrictions.

Method used

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  • Preparation method and application of visible light response hydrogen generation photocatalyst GO/SiC/WO3
  • Preparation method and application of visible light response hydrogen generation photocatalyst GO/SiC/WO3
  • Preparation method and application of visible light response hydrogen generation photocatalyst GO/SiC/WO3

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Experimental program
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Embodiment 1

[0025] (1) Preparation of pure SiC: Put the SiC powder in a muffle furnace, bake it at 700°C for 5 hours, and let it cool down to room temperature naturally to remove impurity carbon; seal it in 2% HF solution and soak it overnight to remove SiO 2 and other oxides; repeated centrifugal washing with deionized water 11 times to pH = 7, placed in a vacuum oven, and vacuum-dried at 60°C;

[0026] (2) WO 3 Suspension: at room temperature, 0.1311g WO 3 Place in 100mL deionized water, mix well to get WO 3 suspension;

[0027] (3) Mixing: at room temperature, to WO 3 Add 5.0g of pure SiC, 0.05g of GO and 2 drops of 1-butyl-3-methylimidazolium hexafluorophosphate ionic liquid to the suspension in sequence, and stir it ultrasonically for 10h to make it evenly mixed;

[0028] (4) Preparation of visible light-responsive hydrogen production photocatalyst GO / SiC / WO by hydrothermal synthesis 3 : put the suspension after ultrasonic above in a 300mL high-temperature reaction kettle, react...

Embodiment 2

[0030] This embodiment except step (2) WO 3 0.3412gWO 3 , others are identical with embodiment 1, obtain SGW-5 photocatalytic material; WO 3 The weight percentage in the hydrothermal reaction system is 5% (calculated as tungsten element).

Embodiment 3

[0032] This embodiment except step (2) WO 3 0.5690g WO 3 , others are identical with embodiment 1, obtain SGW-8 photocatalytic material; WO 3 The weight percentage in the hydrothermal reaction system is 8% (calculated as tungsten element).

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Abstract

The invention discloses a preparation method and application of a visible light response hydrogen generation photocatalyst GO / SiC / WO3. The preparation method comprises the following steps: a, siliconcarbide (SiC) is pretreated; b, tungsten trioxide (WO3) is taken as a raw material to prepare a 8wt% WO3 solution of a whole hydrothermal reaction system; c, 100 mL of the 8wt% WO3 solution is taken and placed in a beaker, and the SiC, graphene oxide (GO) and two drops of 1-butyl-3-methylimidazolium hexafluorophosphate ionic liquid are sequentially added, and ultrasonically stirred to be evenly mixed; and d, the mixture is transferred into a high-temperature reaction kettle to react for 20 h at 200 DEG C, then centrifugal washing is conducted till the pH is 7, the mixture is placed in a vacuumdrying box to be subjected to vacuum drying for standby application, and the visible light response hydrogen generation photocatalyst GO / SiC / WO3 is obtained through hydrothermal synthesis. Through the synergistic effect of the double cocatalysts, namely the graphene-like material GO and the non-graphene-like material WO3, and the amphipathicity of the ionic liquid, the visible light response hydrogen generation photocatalyst GO / SiC / WO3 is prepared, the performance of visible light photocatalytic water decomposition for hydrogen generation is improved, and a certain foundation can be laid forsubsequent efficient application of the visible light catalyst.

Description

technical field [0001] The invention relates to a preparation method of a visible light hydrogen production photocatalyst, in particular to a visible light response hydrogen production photocatalyst GO / SiC / WO 3 Preparation method and application. Background technique [0002] At present, most of the known hydrogen-producing photocatalysts are based on TiO 2 Based on the modification, it is more in line with the requirements of visible light photocatalytic hydrogen production, and promotes the efficiency of hydrogen production. The catalyst has a certain catalytic effect, but TiO 2 The band gap itself is more in line with the requirements of ultraviolet photocatalytic hydrogen production. In view of the forbidden band width range of SiC itself and the positions of its conduction band and valence band, it fully meets the requirements of photolysis of water, and it is used for photocatalytic decomposition of water to produce hydrogen. However, there are some defects in itse...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01J27/224B01J35/10C01B3/04
CPCB01J27/224B01J35/0033B01J35/004B01J35/1004C01B3/042Y02E60/36
Inventor 张燕张玉琰郦雪赵晓涵吕宪俊胡术刚陈平
Owner SHANDONG UNIV OF SCI & TECH
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