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A device for fabricating patterned graphene by laser-induced deposition

A laser-induced graphene technology, applied in the graphene field, can solve the problems of complex process and high manufacturing cost

Active Publication Date: 2018-11-13
XIAMEN UNIV
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] The object of the present invention is to provide a device for manufacturing patterned graphene by laser-induced deposition for the existing defects of high manufacturing cost and complicated process of graphene

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  • A device for fabricating patterned graphene by laser-induced deposition

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Embodiment Construction

[0010] In order to achieve the above objects, the present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments.

[0011] see figure 1 , the embodiment of the present invention is provided with an electrospinning direct writing precursor platform, a laser-induced grapheneization platform, and a receiving and deposited graphene platform; the electrospinning direct writing precursor platform is provided with a syringe pump 1, a syringe 2, and a DC power supply 3; Laser-Induced Grapheneization Platform Featuring CO 2 Laser 4 and inert gas protection system 5; receiving and depositing graphene platform is provided with collecting plate 6 and two-dimensional motion platform 7; described syringe 2 is connected with syringe pump 1, and DC power supply 3 supplies power for syringe 2, CO 2 The beam of the laser 4 is focused on the Taylor cone jet outlet 8 of the injector 2, the collecting plate 6 is set on the two-di...

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Abstract

The invention discloses a device for manufacturing patterned graphene through laser-induced deposition, and relates to the field of graphene. The device comprises an electrospinning direct-write precursor platform, a laser-induced graphene platform and a deposition graphene receiving platform, wherein the electrospinning direct-write precursor platform is provided with an injection pump, an injector and a direct current power supply; the laser-induced graphene platform is provided with a CO2 laser and an inert gas protection system; the deposition graphene receiving platform is provided with a collection plate and a two-dimensional motion platform; the injector is connected with the injection pump, the direct current power supply provides power for the injector, the light beam of the CO2 laser is focused on the Taylor cone outflux of the injector, the collection plate is arranged on the two-dimensional motion platform and positioned below the Taylor cone outflux of the injector, and the inert gas protection system provides inert gas protection for the deposition graphene receiving platform. The device of the laser-induced deposition manufacturing patterned graphene has the advantages of being continuable in manufacturing, low in cost and low in environment requirement and equipment requirement.

Description

technical field [0001] The invention relates to graphene, in particular to a device for manufacturing patterned graphene by laser-induced deposition. Background technique [0002] Since the material of graphene was discovered in 2004, relevant research and news have never stopped. Graphene is a new carbon material in which carbon atoms are tightly packed into a single-layer two-dimensional honeycomb lattice structure. The thickness of this graphene crystal film is only 0.335nm, which is only 1 / 200,000 of the diameter of a hair. It is known that the material with the highest strength in the world has excellent properties such as heat, force and electricity. The preparation of graphene can be roughly divided into physical methods (liquid phase exfoliation method, mechanical exfoliation method) and chemical methods (CVD, SiC epitaxial growth, etc.). Among them, the chemical method was studied earlier, mainly using the benzene ring or other aromatic system as the core, through...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): D01D5/00C01B32/184B82Y30/00B82Y40/00
CPCB82Y30/00B82Y40/00
Inventor 吴德志邓磊孙瑜朱宇超罗毅辉赵扬王凌云林立伟
Owner XIAMEN UNIV
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