A method and device for controlling non-sensitive layer errors in the process of preparing multi-layer film elements

Abstract

The embodiment of the present invention discloses a non-sensitive layer error control method and device in the process of preparing a multilayer film element, which utilizes the advantages of high sensitivity of the thin layer prepared by the crystal control method, controls the front part of the non-sensitive layer, and makes the remaining photo-controlled deposition thickness The part falls on the best sensitive position for monitoring, reducing the monitoring error caused by the insensitivity of the light control signal. The back end part of the non-sensitive layer is prepared by the light control method, so that the remaining light control deposition thickness part falls on the best sensitive position for monitoring, which can be simultaneously Compensate the preparation errors caused by the crystal control part and the optical control itself to control the deposition, and use the combination of optical control and crystal control to deposit the non-sensitive layer of the multi-layer thin film element, avoiding the use of only the light control method to prepare the non-sensitive layer The resulting control error significantly improves the deposition accuracy of the non-sensitive layer in the light control system.

Description

technical field [0001] The invention relates to the field of thin film monitoring, in particular to a non-sensitive layer error control method and device in the process of preparing a multilayer film element. Background technique [0002] In recent years, with the continuous development of optical science and technology, the performance indicators of thin-film components have become higher and higher, the design and preparation of thin-film component film systems have become more and more complex, and the requirements for deposition process precision have become higher and higher. Especially in multilayer membrane elements, the complexity and difficulty from film system design to manufacturing process are very high. Under some conditions, the number of layers of more complex multilayer membrane elements usually reaches dozens or even hundreds of layers. And most of these film systems are irregular film systems, how to realize the precise control of the film thickness in the ...

AI Technical Summary

Problems solved by technology

However, due to the division of the control sheet and the selection of the monitoring wavelength in the light control method, it is usually difficult to achieve the best monitoring of each layer of film, and it is impossible to make the control wavelength of each layer of film fall to the most sensitive point of signal change, and frequently change the control wavelength It will also lead to the increase of the system error. Therefore, these insensitive layers are the main source of error in the multilayer film preparation process, so the appearance of the insensitive layer in the photocontrol method will lead to the continuous accumulation of errors in the multilayer film deposition process. , the size of this cumulative error determines whether the multilayer film system can be successfully prepared

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