A Calculation Method of Spectral Thermal Emissivity of Multilayer Optical Film

A technology of optical thin film and multilayer thin film, applied in the field of spectral thermal emissivity characterization

Active Publication Date: 2020-05-05
TIANJIN JINHANG INST OF TECH PHYSICS
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] The purpose of this invention is to propose a calculation method for the spectral thermal emissivity of a multilayer optical film to solve the problem of how to reduce the cost of direct thermal radiation measurement and the complexity of the measurement device

Method used

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  • A Calculation Method of Spectral Thermal Emissivity of Multilayer Optical Film
  • A Calculation Method of Spectral Thermal Emissivity of Multilayer Optical Film
  • A Calculation Method of Spectral Thermal Emissivity of Multilayer Optical Film

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Embodiment

[0157] This embodiment selects the double-sided anti-reflection film of zinc sulfide substrate, such as figure 1 shown. The substrate thickness of zinc sulfide is selected as 5mm, and the thermal radiation characteristics of the multilayer film A-substrate-multilayer film B system are calculated at room temperature in the range of 7.5μm-9.7μm. The thin film materials are germanium and yttrium fluoride respectively, and the film systems of interface A and interface B are as follows:

[0158] ZnS|0.5298H 0.1411L 1.0932H 0.5478M 0.2883L 0.3019M|Air

[0159] Among them, λ 0 =8 μm, H is germanium, L is yttrium fluoride, and M is zinc sulfide. The forward and backward propagation characteristics of light waves at interface A and interface B are as follows: figure 2 and image 3 shown.

[0160] The base material is chosen as zinc sulfide, whose optical constants are as Figure 4 shown. The thin film materials are germanium and yttrium fluoride, respectively, and their optica...

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Abstract

The invention belongs to the field of spectral thermal emissivity characterization, and in particular relates to a method for calculating the spectral thermal emissivity of a multilayer optical film. The calculation method provided by the present invention is simple and operable. For a determined multilayer film-substrate-multilayer film system structure, only the thermo-optic coefficients of the substrate and film materials need to be determined to fully express the spectral orientation of the optical multilayer film Emissivity, Directional Emissivity, Spectral Emissivity, and Integrated Spatial Emissivity. Adopting the method can avoid the cumbersomeness of direct measurement and the complicated structure design of the measuring instrument, and has certain scientific and application value.

Description

technical field [0001] The invention belongs to the field of spectral thermal emissivity characterization, and in particular relates to a method for calculating the spectral thermal emissivity of a multilayer optical film. Background technique [0002] With the development of infrared photoelectric technology, the passive photoelectric detection and imaging system based on target infrared radiation has become an important basic technology in the field of basic science and application technology, such as infrared thermal imager, infrared radiation thermometer, infrared high-resolution spectrometer, Infrared imaging guidance system, etc. In the field of aerospace applications, infrared optoelectronic devices represented by infrared imaging guidance systems are widely used in aircraft. [0003] In recent years, as the flight speed of the flight system develops from subsonic speed to hypersonic speed, the aircraft with infrared imaging device flies at high speed in the dense at...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01J5/00
CPCG01J5/0003G01J5/802
Inventor 刘华松刘丹丹杨霄姜承慧陈丹季一勤
Owner TIANJIN JINHANG INST OF TECH PHYSICS
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