Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Face sketch synthesis method and system based on gabor features

A synthesis method and sketch technology, applied in the field of face sketch synthesis based on Gabor features, can solve the problems of reduced synthesis effect and loss of high-frequency information, and achieve the effect of solving unclear contours, accurate representation coefficients and high quality.

Active Publication Date: 2017-07-21
WUHAN UNIV
View PDF3 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0012] The existing sketch synthesis methods all use the Euclidean distance to measure two images or image blocks. Since the illumination has a great influence on the pixels, the high-frequency information will be lost due to the illumination change, and the synthesis effect will drop sharply. Therefore, the synthesis effect of the above method needs to be To further strengthen, it is also necessary to find a feature space that is more robust to illumination

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Face sketch synthesis method and system based on gabor features
  • Face sketch synthesis method and system based on gabor features
  • Face sketch synthesis method and system based on gabor features

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0043] The present invention is based on the human face sketch synthesis method of Gabor feature, and concrete steps are as follows:

[0044] Step 1, dividing pixel blocks.

[0045] Use the same division method to divide the input face photos, face photo samples in the face photo training set, and face sketch samples in the face sketch training set into overlapping pixel blocks. The input face photos are the face photos to be synthesized. The input face photos, face photo samples, and face sketch samples have the same size, and the face photo samples and face sketch samples correspond one-to-one. The size of the divided pixel blocks in this specific implementation is n×n.

[0046] Step 2, extract the Gabor feature of the pixel block, obtain the Stein divergence matrix based on the covariance matrix of the Gabor feature of the pixel block, and convert the pixel space to the Stein divergence space.

[0047] This step further includes sub-steps:

[0048] 2.1 For all pixel bloc...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a GABOR characteristic based face sketch synthetic method and system. The synthetic method comprises the following steps: dividing a face photo to be synthesized, a face photo sample and a face sketch sample into mutually overlapped pixel blocks; extracting the Gabor characteristics of each pixel block, and acquiring the Stein divergence matrix on the basis of the covariance matrix of the Gabor characteristics of the pixel block; acquiring the optimal weight on the basis of the Stein divergence matrix and the rebuilding coefficient of each pixel block of the face photo sample; adopting the optimal weight for weighting synthesis on the pixel block at the corresponding position of the face sketch sample to acquire a synthetic face sketch pixel block; integrating the synthetic face sketch pixel block to acquire the synthetic face sketch corresponding to the face photo to be synthesized. The synthetic method and system can synthesize the face sketch in higher quality, and can be applied to criminal investigation.

Description

technical field [0001] The invention belongs to the technical field of human face sketch synthesis, and in particular relates to a Gabor feature-based human face sketch synthesis method and system. Background technique [0002] In recent years, retrieving photos of criminal suspects from face photo databases has been widely used in law enforcement as a means of criminal investigation. However, sometimes the photos of the suspects cannot be obtained, and the artist can only draw a sketch of the suspect's face based on the memories of the witnesses, and then use the sketch of the face for retrieval. However, due to the obvious heterogeneity of face sketches and face photos, and the unknown psychological mechanism involved in the generation of face sketches, the accuracy of recognizing face sketches using traditional face recognition methods is very low. One of the methods to solve this problem is to synthesize pseudo-face photos or pseudo-face sketches based on face sketches ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G06T3/40
Inventor 胡瑞敏关健江俊君韩镇董小慧
Owner WUHAN UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products