Eureka AIR delivers breakthrough ideas for toughest innovation challenges, trusted by R&D personnel around the world.

Continuous drying module for use in semiconductor integrated manufacturing production line

A production line and semiconductor technology, applied in semiconductor/solid-state device manufacturing, electrical components, circuits, etc., can solve the problems of high manufacturing cost and complex structure of drying equipment, achieve continuous drying and realize the effect of modular design

Inactive Publication Date: 2013-04-17
王奉瑾
View PDF8 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, the common drying method is hot nitrogen drying. Since the integrated sealing manufacturing system is usually used in the prior art to prepare semiconductor integrated manufacturing, in order to make the drying equipment well connected with other equipment, the structure of the drying equipment is complicated and the manufacturing cost is too high. high

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Continuous drying module for use in semiconductor integrated manufacturing production line
  • Continuous drying module for use in semiconductor integrated manufacturing production line
  • Continuous drying module for use in semiconductor integrated manufacturing production line

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0020] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.

[0021] Please refer to figure 1 , a continuous drying module used in a semiconductor integrated manufacturing production line, including a housing 1, the lateral sides of the housing 1 are respectively provided with an inlet 11 and an outlet 12 for the conveyor belt 2 to pass through, and the conveyor belt 2 passes the The casing 1 is divided into an upper cavity 13 and a lower cavity 14, and the entrance 11 and the exit 12 of the casing 1 are respectively provided with roller groups 3 for dynamically clamping the conveyor belt 2, and each of the roller groups 3 includes a sticker The upper roller...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to the field of semiconductor integrated manufacturing, in particular to a continuous drying module for use in a semiconductor integrated manufacturing production line. The invention provides a continuous drying module for use in a semiconductor integrated manufacturing production line. Both sides of a shell are provided with an inlet and an outlet through which a conveying belt passes, and drum groups for dynamically clamping the conveying belt are arranged at the inlet and the outlet, so that the effect of dynamically sealing the shell and the conveying belt is achieved when the conveying belt passes through the shell from the inlet and the outlet. Due to the adoption of the continuous drying module provided by the invention, a continuous drying function on a photosemiconductor substrate can be realized, and the quality of a gas in the shell can be controlled in real time in a drying process; and meanwhile, a modular design of a drying process in the semiconductor integrated manufacturing production line is realized.

Description

technical field [0001] The invention relates to the field of semiconductor integrated manufacturing production equipment, in particular to a continuous drying module used in a semiconductor integrated manufacturing production line. Background technique [0002] Since the production process of semiconductor integrated manufacturing needs to be completed step by step by multiple processes, such as cleaning treatment, drying treatment, isolation treatment, PVD coating, etc., and each process step needs to be carried out in a closed environment, the existing In the technology, an integrated sealed manufacturing system is usually used, so that each step of the process can be carried out in the same closed environment. In the entire manufacturing process of semiconductor integrated manufacturing, the drying process is generally between the cleaning process and the isolation process. Its task is to dry the liquid contained in the cleaned semiconductor substrate for subsequent furth...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): H01L21/67
Inventor 王奉瑾
Owner 王奉瑾
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Eureka Blog
Learn More
PatSnap group products