Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Pulse deuterium fluoride (DF) laser device main engine structure with molecular sieve adopted for processing

A technology of molecular sieves and lasers, applied in lasers, phonon exciters, laser components, etc., can solve problems such as explosives, continuous wave lasers with large structures, and low reliability, and achieve high average power laser output and average power The effect of laser output

Inactive Publication Date: 2013-04-10
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
View PDF1 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In order to solve the shortcomings of existing continuous wave lasers, such as large structure, easy explosion during use, difficult maintenance, and low reliability, the present invention provides a pulsed DF laser host structure that adopts molecular sieve processing

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Pulse deuterium fluoride (DF) laser device main engine structure with molecular sieve adopted for processing

Examples

Experimental program
Comparison scheme
Effect test

specific Embodiment approach 1

[0010] Specific implementation mode one, combination figure 1 In this embodiment, the main structure of the pulsed DF laser with molecular sieve processing is described, including the pump source 1, the insulating plate 2, the resonant cavity 3, the discharge cavity 4, the housing 5, the upper left runner cavity 6, the first heat exchanger 7, and the right Upper flow channel cavity 8, fan 9, bell mouth 10, molecular sieve 11, second heat exchanger 12, lower flow channel cavity 13, discharge electrode 14; the pump source 1 is connected to the discharge electrode 14 through the insulating plate 2; the upper left flow channel The cavity 6 is connected to the upper end of the discharge cavity 4 through a flange, and the air flow is introduced into the discharge cavity 4; the first heat exchanger 7 is respectively connected to the upper left runner cavity 6 and the upper right runner cavity 8 through the flange, and a rubber gasket is added at the connection , Used to adjust the dis...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses Pulse deuterium fluoride (DF) laser device main engine structure with a molecular sieve adopted for processing and belongs to the technical field of superpower laser devices. An existing continuous wave laser device has the disadvantages of being large in structure, easy to explode and difficult to maintain in using process, and low in reliability. A pumping source is connected with a discharge electrode through an insulating plate. An upper left flow pass chamber is connected with the upper end of a discharging chamber. A first heat exchanger is respectively connected with the upper left flow pass chamber and an upper right flow pass chamber. An air outlet of a draught fan is connected with the upper right flow pass chamber through a flange. A wiring end of the draught fan is arranged outside an outer shell and is fixed on the shell body of the outer shell. A lower flow pass chamber is connected with the lower end of the discharging chamber. The lower flow pass chamber is connected with a second heat changer through a flange. The molecular sieve is connected on the second heat changer through a flange. The air which cooled by the second heat changer is exhausted to the hollow part of a chamber body through the molecular sieve. A resonant cavity is installed outside the outer shell. The pulse DF laser device main engine structure with the molecular sieve adopted for the processing achieves high average power laser output.

Description

Technical field [0001] The invention relates to the technical field of high-power lasers, in particular to a host structure design of a non-chain pulse DF chemical laser triggered by a discharge with a molecular sieve. Background technique [0002] The high-power DF laser, which has developed rapidly in recent years, has an output band of 3.5-4.1μm and a center wavelength of 3.8μm. Its operation mode is divided into two kinds of continuous wave and pulse. The current domestic research focuses on continuous wave mode. Continuous wave lasers have the advantages of high output power (up to megawatts), but they are large in structure, easy to explode, difficult to maintain, and low in reliability. The discharge-induced non-chain pulse DF laser avoids the shortcomings of continuous wave operation, and has the advantages of high average power and high peak power. In addition, the non-chain pulse DF laser has easy operation, no corrosion and explosion hazards, etc. advantage. [0003] ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01S3/03H01S3/036H01S3/041H01S3/223
Inventor 郭劲邵春雷谢冀江张来明邵明振
Owner CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products