ICP-MS (Inductively Coupled Plasma-Mass Spectrometry) online sampling device and online monitoring method of metal impurities

A technology of ICP-MS and sampling device, which is applied in the field of semiconductor integrated circuit manufacturing, can solve the problems of chemical system pollution, result deviation, etc., and achieve the effect of cost saving

Inactive Publication Date: 2013-01-30
WUHAN XINXIN SEMICON MFG CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0008] The purpose of the present invention is to provide an ICP-MS online sampling device and a metal impurity online monitoring method to solve the problem that the sampling of the chemical system is affected by the sampling environment, sampling container, etc. and contamination of the sample analysis process, resulting in biased results

Method used

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  • ICP-MS (Inductively Coupled Plasma-Mass Spectrometry) online sampling device and online monitoring method of metal impurities
  • ICP-MS (Inductively Coupled Plasma-Mass Spectrometry) online sampling device and online monitoring method of metal impurities
  • ICP-MS (Inductively Coupled Plasma-Mass Spectrometry) online sampling device and online monitoring method of metal impurities

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Embodiment 1

[0035] Please refer to figure 1 , figure 1 The structural diagram of the ICP-MS online sampling device provided for the first embodiment of the present invention, such as figure 1 As shown, the ICP-MS online sampling device includes: a frame 100, a pipeline connection system 200 arranged in the frame 100 and a pipeline control system, and the pipeline connection system 200 is connected to the chemical system 300 to be tested The ICP-MS sampling needle 401 is connected to the ICP-MS analyzer 400 , and the pipeline control system controls the pipeline connection system 200 .

[0036] Wherein, the pipeline connection system 200 includes a blank verification pipeline system and a chemical test pipeline system, and the blank verification pipeline system includes a first valve V1, a fourth valve V4, a water tank 203, and a fifth valve connected in sequence through pipelines. Valve V5 and the first connector 204, the first valve V1 is connected to an ultrapure water system 301, the...

Embodiment 2

[0053] Please refer to Figure 2 to Figure 3 ,in, figure 2 The top view of the ICP-MS online sampling device provided for the second embodiment of the present invention, image 3 The structural representation of the pipeline connection system of the ICP-MS online sampling device provided for the second embodiment of the present invention, as Figure 2 to Figure 3 As shown, the ICP-MS online sampling device includes: a frame 100, a pipeline connection system 200, a pipeline control system, a sample tray 600 and a rotating lifting rod 700, and the pipeline connection system 200, the pipeline control system, and the sample tray 600 and the rotating lifting rod 700 are arranged in the frame 100, and the pipeline connection system 200 connects the chemical system 300 to be tested and the ICP-MS sampling needle 401, and the ICP-MS sampling needle 401 and the ICP - The MS analyzer 400 is connected, the pipeline control system controls the pipeline connection system 200, a pluralit...

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Abstract

The invention discloses an ICP-MS (Inductively Coupled Plasma-Mass Spectrometry) online sampling device. The device disclosed by the invention comprises a framework, a pipeline connection system and a pipeline control system which are arranged in the framework; the pipeline connection system is connected with a chemical system to be tested and an ICP-MC sampling probe; and the pipeline control system is used for controlling the pipeline connection system. Meanwhile, the invention also discloses an online monitoring method of metal impurities. According to the method disclosed by the invention, the monitoring to the metal impurities of the chemical system to be tested is realized through connecting the ICP-MS online sampling device with an ICP-MS analyzer and the chemical system to be tested. Because the ICP-MS online sampling device can be directly connected with the chemical system to be tested and the ICP-MS analyzer, the measuring result cannot be influenced by a sampling environment, cross contamination of sample conversion and a sampling container; and the device provided by the invention can satisfy daily monitoring to chemicals of ppt (Preproduction Test) grade and can realize the function that metal impurities of multiple chemicals systems can be monitored by one ICP-MS analyzer so that the cost is saved.

Description

technical field [0001] The invention relates to the field of semiconductor integrated circuit manufacturing, in particular to an ICP-MS online sampling device for monitoring metal impurities in liquid chemicals used for semiconductor manufacturing and an online monitoring method for metal impurities. Background technique [0002] In the production process of the semiconductor industry, the ultrapure water used, the metal impurities in the liquid chemicals, and even the metal impurities in the air have a great impact on the yield of semiconductor products; among them, due to the direct participation in the manufacture of devices, ultrapure water The influence of metal impurities in liquid chemicals and liquid chemicals on semiconductor products is even more important. Therefore, generally speaking, chip processing factories have formulated a series of strict specifications for ultrapure water and liquid chemicals required for products with different line widths, so as to ensu...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01N1/10G01N27/62G01N27/626
Inventor 张士仁刘克斌方明海吴静銮
Owner WUHAN XINXIN SEMICON MFG CO LTD
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