Light emitting element, light emitting element manufacturing method and illuminating device
A technology for a light-emitting element and a manufacturing method, which is applied to lighting devices, semiconductor/solid-state device manufacturing, electrical components, etc., can solve problems such as hindering the miniaturization of devices, and achieve the effects of increasing the occupied space and simplifying the process.
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Embodiment 1
[0140] (Method of manufacturing organic EL element)
[0141] The glass substrate formed by patterning ITO with a film thickness of about 150 nm formed by the sputtering method is cleaned with organic solvents, alkaline cleaning agents, and ultrapure water, and dried, and then ultraviolet-ozone ( UV-O 3 ) Device (manufactured by Technovision Co., Ltd., trade name "MODEL 312UV-O 3 Cleaning system'') UV-O on the dried substrate 3 Treatment (Liquefaction treatment).
[0142] The suspension of poly(3,4)ethylenedioxythiophene / polystyrenesulfonic acid (manufactured by HC Starck-V Tech, trade name "Bytron P TPAI 4083") was filtered with a filter with a diameter of 0.5 μm, and then Using spin coating, the suspension was formed into a film with a thickness of 70 nm on the ITO surface side of the substrate, and then dried on a hot plate at 200° C. for 10 minutes in the atmosphere.
[0143] Next, a solvent prepared by mixing xylene and anisole at a ratio of 1:1 was used to prepare a polymer org...
Embodiment 2
[0153] After the organic EL element was produced by the same method as in Example 1, the substrate was transferred from the vapor deposition chamber to the membrane sealing device (manufactured by VITEX, USA, trade name "Guardian 200") without being exposed to the atmosphere . Align the mask on the substrate. Next, the substrate is transferred to an inorganic film forming chamber, and a sputtering method is used to form a film of aluminum oxide as the first inorganic layer. Using an Al metal target with a purity of 5N, argon and oxygen were introduced to form a film of aluminum oxide on the substrate. Thus, a transparent and flat aluminum oxide film with a thickness of about 60 nm is obtained. Then, through the vacuum evaporation method, to about Coumarin 6 (manufactured by Aldrich, trade name "coumarin 6"), which is the color conversion material, is formed into a film with a vapor deposition speed of The color conversion layer.
[0154] After the color conversion layer is ...
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