Wafer rotating speed detection device

A rotational speed detection and wafer technology, which is applied to devices, electrical components, circuits, etc. using optical methods, and can solve problems such as poor sealing effect of the inner cavity structure.

Active Publication Date: 2021-02-09
BEIJING SEMICON EQUIP INST THE 45TH RES INST OF CETC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The purpose of the present invention is to provide a wafer rotation speed detection device to solve the technical problem of the poor sealing effect of the inner cavity structure of the speed measurement device in the prior art to a certain extent

Method used

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Embodiment Construction

[0027] The technical solutions of the present invention will be clearly and completely described below in conjunction with the accompanying drawings. Apparently, the described embodiments are some of the embodiments of the present invention, but not all of them.

[0028] The components of the embodiments of the invention generally described and shown in the figures herein may be arranged and designed in a variety of different configurations. Accordingly, the following detailed description of the embodiments of the invention provided in the accompanying drawings is not intended to limit the scope of the claimed invention, but merely represents selected embodiments of the invention.

[0029] Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0030] In the description of the present invention, it should be noted that the...

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Abstract

The invention relates to the field of wafer cleaning equipment, in particular to a wafer rotating speed detection device. The wafer rotating speed detection device comprises a fixed seat cylinder anda driven shaft, a mounting hole is formed in an end cover at one end of the fixed seat cylinder, and the driven shaft extends into the fixed seat cylinder through the mounting hole and is rotatably connected with the fixed seat cylinder through a first bearing and a second bearing. An air inlet is formed between the first bearing and the second bearing on the fixed seat cylinder, a first flow channel is formed in the side wall of the driven shaft, one end of the first flow channel is located between the first bearing and the second bearing, and the other end of the first flow channel extends to the side wall, opposite to the inner wall of the mounting hole of the fixed seat cylinder, of the driven shaft, so that gas entering the fixed seat cylinder can flow to the mounting hole through thefirst flow channel, then the gas is guided into a scrubbing box through a gap between the mounting hole and the driven shaft, a blocking effect is achieved through the gas, and the situation that cleaning liquid in the scrubbing box leaks through an inner cavity of the fixed seat cylinder is avoided.

Description

technical field [0001] The present application relates to the field of wafer cleaning equipment, in particular to a wafer rotational speed detection device. Background technique [0002] During the cleaning process of the wafer, it is necessary to measure the rotation speed of the wafer. Usually, a speed measuring device is installed on the wafer scrubbing box. It is rotationally connected with the seating cylinder through bearings, and the driven shaft assists the rotation of the wafer through the driven wheel, and relies on the rotation of the wafer to achieve follow-up rotation. The rotational speed of the wafer can be obtained by measuring the rotational speed of the driven shaft. Since both the seating cylinder and one end of the driven shaft are located in the scrubbing box, in order to prevent the cleaning liquid in the scrubbing box from leaking through the inner cavity of the test device, it is necessary to seal the connection between the driven shaft and the seatin...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01P3/36H01L21/67
CPCG01P3/36H01L21/6704
Inventor 陶利权于高洋宋文超刘盈楹王丽江胡天水刘凯文郭育澎闫芸
Owner BEIJING SEMICON EQUIP INST THE 45TH RES INST OF CETC
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