Fitting and analyzing method for slot potential distribution function of cylindrical electrostatic multipole lens

Abstract

The invention discloses a fitting and analyzing method for a slot potential distribution function of a cylindrical electrostatic multipole lens. Three-dimensional space electromagnetic field distribution of the cylindrical electrostatic multipole lens with different slot central angles is obtained through calculation; the electrostatic multipolar lens calculates space cylindrical coordinate valuesof finite element grid nodes in a field domain and forms an independent variable point set and a dependent variable point set with the corresponding potential values; the potential distribution at the inner radius gap of the cylindrical electrostatic multi-pole lens is fit through the corresponding relation of the two point sets to obtain a gap potential distribution fitting function; a slot potential distribution fitting function of the cylindrical electrostatic multipole lens with the shielding cylinder or the peripheral electrodes is corrected by considering the influence of different boundary conditions; Fourier analysis is performed on the potential function on the cylindrical surface according to the slot potential distribution fitting function to obtain field position harmonic component expressions of different orders; according to an application scene of the cylindrical electrostatic multipole lens, field position harmonic component expressions of different orders are analyzedto obtain an optimal electrode feeding mode.

Description

technical field [0001] The invention relates to the field of electron optics, especially the fitting and analysis method of the gap potential distribution of the multi-pole deflection lens in the high-resolution and large-scanning field electron optical imaging system, and specifically relates to a gap potential distribution function of a cylindrical electrostatic multi-pole lens fitting and analysis methods. Background technique [0002] At present, with the development of electronic optical precision instruments such as electron beam IC online rapid detection system, the requirements for the resolution of electron optical system are constantly increasing. In order to achieve the focusing and deflection requirements of ultra-high resolution, and to solve the contradiction of achieving a finer beam spot and a larger scanning range, the system generally consists of a magnetic focusing lens and an electrostatic multipole deflection lens. To obtain sufficiently high resolution...

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Problems solved by technology

[0007] These assumptions are too simple to fully compound the actual field distribution, and the applicability is also limited

Therefore, it will affect the calculation accuracy of the multipolar field component expansion coefficient, which will further affect the calculation accuracy of the aberration of the entire system

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