Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Far-infrared wide-band cyclical absorber structure

A wide-band, far-infrared technology, applied in electrical components, antennas, etc., can solve the problems of narrow absorption frequency band and single frequency band

Active Publication Date: 2016-07-13
UNIV OF ELECTRONIC SCI & TECH OF CHINA
View PDF5 Cites 12 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, since this absorption effect is based on the electromagnetic resonance characteristics of the periodic perfe

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Far-infrared wide-band cyclical absorber structure
  • Far-infrared wide-band cyclical absorber structure
  • Far-infrared wide-band cyclical absorber structure

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0021] In the present invention, the wave-absorbing structure is designed on a substrate supported by Si, the bottom continuous metal film and metal layer are both Al, and the dielectric layer is Al 2 o 3 , a=6um, the diameter of the absorbing unit d=3.2um, the thickness of the first dielectric layer is 0.25um, the thickness of the second dielectric layer is 0.3um, the thickness of the metal layer is 0.1um, and the thickness of the underlying metal film is 200nm .

[0022] The parameters of reflectivity and transmittance were obtained through the commercial electromagnetic simulation software CSTMicrowaveStudio, and the absorption rate curve was calculated.

[0023] Use the center point of the circular patch as a reference. For a circular patch, the present invention uses its center-to-center distance as a reference for the row pitch and column pitch of the array. figure 1 (a) shows the average value range of each absorbing unit and the occupied bottom metal film and the fi...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Center distanceaaaaaaaaaa
Diameteraaaaaaaaaa
Thicknessaaaaaaaaaa
Login to View More

Abstract

The invention belongs to the technical field of functional materials and devices, and specifically relates to a far-infrared wide-band cyclical absorber structure. The absorber structure of the invention comprises a bottom metal film and an absorber cell array. The absorber cell array sequentially comprises a first dielectric layer and a circular patch array from bottom to top. The circular patch array is composed of circular patches which are transversely and longitudinally arranged on the first continuous dielectric layer in an equidistant manner. A first metal layer, a second dielectric layer and a second metal layer are sequentially arranged on the circular patches from bottom to top. The bottom metal film and the metal layers are made of Al, and the dielectric layers are made of Al2O3. According to the invention, two metal-dielectric interlayer structures are adopted, high band emissivity is achieved within the range of 8-11 microns, wideband characteristic is realized, and the emissivity within the band of 8.7-9.96 microns is higher than 80%. The method is applied to an aerospace thermal control system in order to solve the problem of satellite heat dissipation.

Description

technical field [0001] The invention belongs to the technical field of functional materials and devices, and specifically relates to a far-infrared broadband periodic absorbing structure, which is applied to far-infrared emissivity modulation, atmospheric window material radiation characteristic control, spacecraft thermal control systems and other fields. Background technique [0002] Periodic perfect absorber is a new type of electromagnetic structural device derived from electromagnetic metamaterial in recent years. This wave-absorbing structure utilizes the resonant properties of metamaterials: the metal array unit will generate electrical resonance with the incident electric field, and the parallel currents will be induced between the two layers of metal up and down, resulting in magnetic resonance with the incident magnetic field, so that electromagnetic waves are effectively localized in the structural unit. According to the equivalent medium theory, its electromagne...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): H01Q17/00
CPCH01Q17/00
Inventor 周佩珩谢健翁小龙谢建良邓龙江
Owner UNIV OF ELECTRONIC SCI & TECH OF CHINA
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products