Method and device for measuring direct current electron beam trajectory

A technology of measuring device and electron beam, which is applied in the direction of measuring device, radiation measurement, particle motion recording, etc., can solve the problem of inability to measure DC electron beam, and achieve the effect of improving measurement efficiency and avoiding repeated loading and unloading.

Active Publication Date: 2018-10-16
XIAN AEROSPACE PROPULSION INST
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0007] The invention provides a method and device for measuring the trajectory of a DC electron beam, thereby overcoming the technical problem that the traditional pulsed electron beam trajectory measurement method cannot measure the DC electron beam. The invention provides a method and device for measuring the trajectory of a DC electron beam, which can Accurately measure the trajectory of the DC electron beam in the entire transport extraction channel at one time

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  • Method and device for measuring direct current electron beam trajectory
  • Method and device for measuring direct current electron beam trajectory

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Embodiment 1

[0034] (1) According to the interface size of electron beam source 1 (flange diameter 100mm), estimated diameter of electron beam (10mm), size of permanent magnet lens 23 (outer diameter 40mm, inner diameter 30mm, axial length 15mm) and transport extraction distance (400mm) design measurement axis 21, metal film 22, metal film support 25 and permanent magnet lens support 26: measurement axis 21 mounting flange diameter is 100mm, inner surface is M52×2mm internal thread, outer surface diameter is 64mm, length is 400mm; the metal film 22 is a titanium film with an outer diameter of 40 mm and a thickness of 0.1 mm; the inner diameter of the metal film support 25 is 30 mm, the outer surface is an M52×2 mm external thread, and the thickness is 5 mm; the inner diameter of the permanent magnet lens support 26 is 30 mm. The surface is M52×2mm external thread, and the thickness is 18mm.

[0035] (2) According to the arrangement of the permanent magnet lenses 23 to be measured (place 4 ...

Embodiment 2

[0040] (1) According to the electron beam source 1 interface size (flange diameter 150mm), estimated electron beam diameter (6mm), electromagnetic lens 24 size (outer diameter 180mm, inner diameter 80mm, axial length 60mm) and transport extraction distance ( 390mm) design measurement shaft 21, metal film 22, metal film support 25 and electromagnetic lens support 27: the diameter of the measuring shaft 21 mounting flange is 150mm, the inner surface is M45×2mm internal thread, and the outer surface is M60×2.5mm external thread , the length is 390mm; the metal film 22 is a titanium film with an outer diameter of 38mm and a thickness of 0.1mm; the inner diameter of the metal film support 25 is 32mm, the outer surface is an M45×2mm external thread, and the thickness is 5mm; the inner surface of the electromagnetic lens support 27 is M60×2.5mm internal thread, outer diameter 80mm, thickness 40mm, lens baffles with 2mm outer diameter and 180mm outer diameter at both ends.

[0041](2)...

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Abstract

The invention relates to a direct-current (DC) electron beam track measuring method and a DC electron beam track measuring device. Based on high energy of DC electron beams and relative stability of electron beam tracks, a metal film array is placed vertically on an electron beam transmission path, an electron beam is launched to break down all the metal films instantly so as to leave corresponding film holes in the different metal films, and the track of the electron beam in the whole transmission channel can be obtained quickly and accurately by measuring the size of each film hole. Metal films can be placed in each position needing measurement once, the electron beam track under one parameter condition can be obtained through one experiment, operation is simple, and measurement is accurate. A measuring shaft can be additionally mounted in the transmission channel, a permanent-magnetic lens and an electromagnetic lens can be mounted on the measuring shaft, and the track of a magnetically-controlled DC electron beam can be measured. The difficulty of DC electron beam track measurement is reduced substantially, the efficiency of measurement is improved greatly, and the measurement capability of magnetically-controlled DC electron beams is expanded effectively.

Description

technical field [0001] The invention relates to a method and a device for measuring the trajectory of an electron beam, in particular to a method for measuring the trajectory of a magnetically controlled direct current electron beam. Background technique [0002] Electron beams play an extremely important role in the modification of advanced materials, high-precision welding, and plasma preparation. The electron beam is generated by the electron beam source in a vacuum environment and transported out to the required application environment through a specific device. The quality and efficiency of electron beam transport and extraction are crucial to the application of electron beams, so it is necessary to accurately measure the trajectory of electron beams to guide the design of transport extraction devices. [0003] In the environment of electrostatic field and magnetic field, the beam diameter of the electron beam is very different at different positions in the transmissio...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01T5/10
CPCG01T5/10
Inventor 张志豪张晰哲李光熙王妍邓永锋孙斌
Owner XIAN AEROSPACE PROPULSION INST
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