Mass analyzing magnet for broadband ion beam and implanter system

Abstract

The invention relates to the implantation field of broadband ion beams, and discloses a mass analyzing magnet for broadband ion beams. The mass analyzing magnet comprises a magnet and a coil connected with a power supply. The magnet comprises magnetic poles, a magnet yoke and magnetic shielding plates, the magnetic poles comprise an upper magnetic pole and a lower magnetic pole, the magnetic shielding plates comprise an upper magnetic shielding plate and a lower magnetic shielding plate, and a magnetic field space for the broadband ion beams to pass in a certain route is arranged between the upper magnetic pole and the lower magnetic pole. The invention further discloses an implanter system, which comprises an ion source, an extraction electrode unit, a deflection speed-reducing unit, a mass analyzing magnet, a target workpiece and workpiece transmitting unit, a beam flux measuring and diagnosing unit and a control unit. The invention has the beneficial effect of high quality resolution and nearly zero system aberration, and can generate pure broadband ion beams of 300mm, 450mm and even 1000mm, thereby improving the quality of ultra-low energy ion beams generated by a speed reducer and decreasing the angular dispersion of the ultra-low energy ion beams.

Description

technical field [0001] The invention relates to the field of implantation of broadband ion beams, in particular to a mass analysis magnet and implanter system for broadband ion beams. Background technique [0002] In the prior art, ion beams produced from ion sources typically contain one or more unwanted ions derived from ion chamber materials of the ion source and working gas molecules or solid molecules provided to produce the desired ions. Therefore, it has been standard practice for many years to use a magnetic field mass analyzer to separate these unwanted ions from the ion beam. However, this type of magnetic field mass analyzer has become increasingly difficult and expensive for broadband ion beams, especially those with large aspect ratios and large beam currents. Researchers have developed different ion implantation systems to generate broadband ion beams. However, due to the unsatisfactory performance of the analytical magnets, these types of ion implantation sy...

AI Technical Summary

Problems solved by technology

[0003] In order to solve the problems in the prior art, the present invention provides a mass analysis magnet and injector system for broadband ion beams, which solves the problem that a magnet with suitable mass resolution and system aberration cannot be provided in the current magnet design. Problems with small and broadband ion beams delivering large beam currents

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