A SICM probe-sample distance control method and system

A probe and distance technology, applied in the field of scanning ion conductance microscopy imaging, can solve the problems of tailing, large current deviation, different speeds, etc., to avoid oscillation, speed up the response speed, and easy to shape the effect.

Active Publication Date: 2020-04-21
SHENYANG INST OF AUTOMATION - CHINESE ACAD OF SCI
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Due to the non-linearity of the approximation curve, for the same height change, the current deviation as the feedback value is larger on the rising edge of the sample height, and the current deviation is smaller on the falling edge. If the same PID parameters are used at this time, the Different control values ​​are generated, so that the speed of the probe tracking is different. The change of the height of the sample can be quickly tracked on the rising edge, but it takes longer to complete the tracking of the height on the falling edge, resulting in a tailing phenomenon.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A SICM probe-sample distance control method and system
  • A SICM probe-sample distance control method and system
  • A SICM probe-sample distance control method and system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0045] The present invention will be described in further detail below in conjunction with the accompanying drawings.

[0046] A method for adaptively controlling the distance between a SICM probe and a sample, comprising:

[0047] Step 1. Make an approximation curve before starting scanning. The approximation curve is the relationship curve between the probe / sample distance and the ion current. Use the approximation curve to establish a falling edge compensation function model. The model uses the Z of the current position of the probe and the position of the working point The voltage difference of the axial piezoelectric ceramic is the input, and the output is the ratio of the current deviation between the rising edge and the falling edge corresponding to the same distance;

[0048] Step 2. During the scanning process, record the scanning height of the previous line of the image as the predicted height of the current line to be scanned;

[0049] Step 3. When scanning the cur...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to a probe sample distance control method and system for an SICM (scanning ion conductance microscope). The method includes the following steps that: a falling edge compensationfunction model is established before scanning is carried out; the line scanning height of a previous pixel is recorded during an imaging process and is adopted as the predicted value of a current to-be-scanned line; the difference value of the real-time position of a probe and predicted height, adopted as a parameter, is inputted to the falling edge compensation function model, so that a falling edge compensation coefficient can be obtained; and rising edge and falling edge judgment is carried out, an obtained current deviation is updated; the new current deviation is fed back to a controller,and the controller controls a piezoelectric ceramic to move up and down, so that the probe is always kept at a constant distance from a sample. The system includes an approximation curve module, a falling edge compensation function model building module, a line prediction module, and a feedback control module. With the method and system of the invention adopted, the problem of the difference of the deviation of the rising edge and falling edge of the sample caused by the nonlinearity of an approximation curve can be solved, so that the falling edge blurring of SICM imaging can be eliminated.Compared with conventional PID control, the method and system are more accurate in imaging.

Description

technical field [0001] The invention relates to the technical field of scanning ion conductance microscope (SICM) imaging, in particular to an adaptive control method and system for the distance between a probe and a sample during SICM imaging. Background technique [0002] Scanning ion conductance microscope (SICM) is a scanning probe microscope widely used in biology, medicine, chemistry, materials and other fields. Compared with traditional optical microscope, it has higher resolution. The microscope is limited by the optical diffraction limit, and the resolution cannot reach below 200nm, while the scanning probe microscope uses the interaction between its probe and the sample surface as the imaging basis, and is not affected by the optical diffraction limit, and the resolution can reach several nanometers or tens of nanometers. Nano; Compared with other scanning probe microscopes, SICM is characterized by the non-destructive observation of living cells under physiologica...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): G01Q60/44G01Q10/00
CPCG01Q10/00G01Q60/44
Inventor 刘连庆滕泽宇于鹏杨洋杨铁赵亮李广勇
Owner SHENYANG INST OF AUTOMATION - CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products