Light-free T-shaped stitch for embroidery and embroidering method
An embroidery and stitching technology, applied in the mechanism of embroidery machine, embroidery machine, hand embroidery, etc., can solve the problems of changing portraits and unstable imaging, avoiding concentrated reflection, less stitch crossing, and delicate feeling Effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0033] Example 1: A light-free T-shaped stitch method for embroidery
[0034] Such as figure 1 As shown, the stitching method is composed of a first stitch 1 and a second stitch 2, wherein the first stitch 1 and the second stitch 2 are arranged in a "T" shape on the front of the embroidery cloth, and the first stitch 1 in the "T" shape It is in contact with or spaced from the second pin 2, which means that the horizontal and vertical pins in the "T" shape can be in contact or spaced apart, but they cannot cross. The angle β of the first stitch 1 in the “T” shape relative to the second stitch 2 is in the range of 60° to 90°, preferably in the range of 60° to 70°. The ratio of the length of the first stitch 1 to the length of the second stitch 2 is in the range of 1:0.7 to 1:1.3 (stitch length refers to the length of the embroidery thread between the two eyelets). The light-free T-stitch method is suitable for hand embroidery and machine embroidery.
Embodiment 2
[0035] Embodiment 2: A method of embroidering the lips of a character
[0036] Figure 2~6 Respectively are the sketches of the embroidery stitches of the first to fifth layers of the character’s lips, Figure 7 The five-layer superimposed schematic diagram of the character’s lips. The embroidering method of character lips in this embodiment is as follows: for character lips, embroidery needles and embroidery threads are used to embroider five layers of superimposed embroidery traces on the front of the embroidery fabric in the order of the first to fifth layers of the drawings and the requirements, wherein, Each layer of embroidery is formed by a set of T-shaped stitch units with approximately the same stitch length arranged adjacently on the front of the embroidery fabric. In each layer of embroidery, any T-shaped stitch unit is the center, and the surrounding T-shaped stitch units are arranged obliquely relative to the central T-shaped stitch unit on the embroidery surface. ...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com