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Fast detection method for down cleanliness based on photoresistor

A technology of photoresistor and detection method, which is applied in the field of rapid detection of cleanliness in the process of down processing and cleaning, detection of down cleanliness, and rapid detection of down cleanliness based on photoresistors, can solve the problem of time-consuming and laborious operation, slow detection speed, etc. It is impossible to quantify problems such as down cleanliness, so as to achieve the effect of improving production efficiency, improving quality, and realizing rapid automatic detection.

Inactive Publication Date: 2009-07-08
徐州远景羽绒有限责任公司
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AI Technical Summary

Problems solved by technology

The problem of this method is: because it is manual detection, the detection speed is slow, so the speed of feedback to the production link is slower, which greatly affects the production efficiency of down; Quantify down cleanliness
The use of the above detection method makes the operator time-consuming and laborious, and the quality of down cannot be guaranteed. At present, there is no report on the instrument that can quickly and automatically detect the cleanliness of down at home and abroad.

Method used

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  • Fast detection method for down cleanliness based on photoresistor
  • Fast detection method for down cleanliness based on photoresistor
  • Fast detection method for down cleanliness based on photoresistor

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Embodiment Construction

[0013] as the picture shows

[0014] 1) Enter knowledge base settings:

[0015] The cleanliness of down is determined by detecting the turbidity of the down washing residue. Set a certain intensity beam E 0 Pass transparency to T i The strength of the remaining liquid is E i , then the relationship between them can be expressed as:

[0016] T i = - 1 BL ln E 0 E i - - - ( 1 )

[0017] Here B is the medium scattering constant, which is a constant for down. L is the distance from the light beam to the photoresistor, which is also a constant here. while E i and photoresistor resistance R i There is an inverse proportional relationship: E i =F(R i ), (1) can be rewritten as:

[0018] ...

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Abstract

The invention relates to a method for detecting down cleanliness, in particular to a down-cleanliness rapid detection method based on a photoresistor, which is mainly applied to the rapid detection of the cleanliness in the process of processing and cleaning down and belongs to the technical field of down processing. The method comprises the steps of inputting the settings of a knowledge base and detecting down cleanliness on the basis of the photoresistor, wherein cleaning remaining liquid of down with different cleanliness is collected, irradiated with a 2000LX light beam and then projected on to the photoresistor under the condition with constant current; voltage values at two ends of the photoresistor are measured, taken as cleanliness measurement parameters and input into the knowledge base of an operating system; and current down cleanliness is rapidly obtained by comparing the voltage values at two ends of the photoresistor with the parameters in the knowledge base under the condition with fixed beam intensity and constant current. The method is based on the photoresistor, quantifies the relation between the turbidity of the cleaning remaining liquid and down cleanliness, and realizes the fast automatic detection of down cleanliness.

Description

technical field [0001] The invention relates to a detection method for down cleanliness, in particular to a photosensitive resistance-based fast detection method for down cleanliness, which is mainly used for fast detection of cleanliness during down processing and cleaning, and belongs to the technical field of down processing. Background technique [0002] At present, in the production and processing of down, the cleanliness of down is a very important production technical index, which is directly related to the quality of finished down, so it is necessary to carry out multiple down cleanliness tests in the whole production process, and adjust the production process according to the test results and process. At present, the detection method commonly used at home and abroad is to judge the turbidity of the down cleaning liquid by artificial naked eyes, so as to obtain the current cleanliness of the down. The problem of this method is: because it is manual detection, the de...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N27/02
Inventor 刘峰刘琦王风宇韩东芳刘洪马
Owner 徐州远景羽绒有限责任公司
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