Fast detection method for down cleanliness based on photoresistor
A technology of photoresistor and detection method, which is applied in the field of rapid detection of cleanliness in the process of down processing and cleaning, detection of down cleanliness, and rapid detection of down cleanliness based on photoresistors, can solve the problem of time-consuming and laborious operation, slow detection speed, etc. It is impossible to quantify problems such as down cleanliness, so as to achieve the effect of improving production efficiency, improving quality, and realizing rapid automatic detection.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0013] as the picture shows
[0014] 1) Enter knowledge base settings:
[0015] The cleanliness of down is determined by detecting the turbidity of the down washing residue. Set a certain intensity beam E 0 Pass transparency to T i The strength of the remaining liquid is E i , then the relationship between them can be expressed as:
[0016] T i = - 1 BL ln E 0 E i - - - ( 1 )
[0017] Here B is the medium scattering constant, which is a constant for down. L is the distance from the light beam to the photoresistor, which is also a constant here. while E i and photoresistor resistance R i There is an inverse proportional relationship: E i =F(R i ), (1) can be rewritten as:
[0018] ...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com