Tungsten trioxide nano hollow sphere semiconductor material and preparation method thereof, gas sensor and preparation method and application thereof
A technology of gas sensor and tungsten trioxide, which is applied in the direction of tungsten oxide/tungsten hydroxide, nanotechnology, analytical materials, etc., can solve the problems of high cost, unstable shape of hollow spherical structure materials, environmental pollution, etc. The effect of uniform diameter
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[0031] The invention provides a kind of preparation method of tungsten trioxide nano hollow sphere semiconductor material, comprising the following steps:
[0032] Mix soluble hexavalent tungsten salt, alcoholic water solvent and alkaline precipitant, and conduct hydrothermal reaction of the obtained mixed solution to obtain tungsten trioxide nano hollow sphere semiconductor material;
[0033] The concentration of the hexavalent tungsten salt in the mixed solution is 5-30 mmol / L, and the concentration of the alkaline precipitant is 0.1-0.5 mol / L;
[0034] The temperature of the hydrothermal reaction is 100-200° C., and the time of the hydrothermal reaction is 5-40 hours.
[0035] In the present invention, the water-soluble hexavalent tungsten salt is preferably WCl 6 、Na 2 WO 4 2H 2 O or Na 2 WO 4 .
[0036] In the present invention, the alcohol-water solvent is preferably a mixture of a small molecule alcohol solvent and water, and the volume ratio of the small molecul...
Embodiment 1
[0067] 0.72mmol of WCl 6 Add 60mL ethanol-water (V 乙醇 / V 水 : 30%) solution. After stirring for 5 min on a magnetic stirrer, a slightly white translucent solution was obtained; then it was transferred to a 100 mL polytetrafluoroethylene-lined stainless steel reaction kettle, and 0.1 g of urea was added at the same time to obtain a mixed solution. WCl in the resulting mixture 6 The concentration is 12mmol / L.
[0068] Put the reaction kettle in an electric oven at 120°C for hydrothermal reaction for 24h, and cool naturally to room temperature; the white product was collected by centrifugation, washed with deionized ethanol and deionized water respectively, and then dried overnight at 80°C to obtain WO 3 Nano hollow sphere semiconductor material.
Embodiment 2
[0070] WCl in the resulting mixture 6 The concentration is 16mmol / L, and other conditions are the same as in Example 1.
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